Skip to main content
ATLAS Water Treatment Solutions

Search

Search ATLAS engineering resources

Find research, tools, applications, process designs, and current intelligence from one engineering search.

Start with a discovery path

Research Tools Applications Process Design Intelligence

Start with a discovery path
Back to Process Design
Process design — engineering workflows

High-Purity Water for Advanced Manufacturing

Quality-critical water planning for advanced manufacturing and related uses. Define the end-use basis first: semiconductor UPW, pharmaceutical PW/WFI, power or boiler makeup, and laboratory water are distinct duties.

ApplicationHigh-Purity & Advanced Manufacturing Relevant disciplinesTreatment Process Design

01 Primary Treatment Train

Primary Treatment Train

Six stages from pretreatment to distribution and monitoring.

6 Stages

Scroll horizontally to view all stages

Stage 01 · Pretreatment

Pretreatment

Protect high-purity barriers from feed variability.

Purpose

Define the feed quality and pretreatment boundary that keeps RO and polishing equipment within its operating envelope.

Next decision

Use the declared feed basis to screen RO.

Engineering questions

  • What suspended solids, oxidants, and organics reach RO?
  • Which hardness, alkalinity, silica, and pH/temperature cases set the scaling basis?
  • Which monitoring points prove feed compatibility, and what cleaning or replacement duty is expected?

Key inputs

  • Pretreatment flowm³/h
  • Feed turbidityNTU
  • Feed dissolved solidsmg/L
  • Feed TOCmg/L
  • Feed pHpH
  • Feed temperature°C
  • Feed hardness as CaCO₃mg/L as CaCO₃
  • Feed alkalinity as CaCO₃mg/L as CaCO₃
  • Residual oxidant / target organicsmg/L
  • Dissolved silica as SiO₂mg/L as SiO₂

Key outputs

  • RO-feed turbidity basisNTU
  • RO-feed dissolved-solids basismg/L
  • RO-feed hardness basismg/L as CaCO₃
  • RO-feed alkalinity basismg/L as CaCO₃
  • RO-feed oxidant-residual basismg/L
  • RO-feed dissolved-silica basismg/L as SiO₂

Design Considerations

  • High-purity failure modes can originate in trace contamination and distribution dead legs, not only bulk salt removal.
  • Feed characterization and pretreatment targets depend on the end use and on downstream membrane and polishing limits.
  • UF/MF, carbon, and chemical-dose screens are conditional unit-operation checks; none supplies complete feed characterization or a species-specific RO scaling basis.

Tools for this stage

Available UF/MF System Designer Screen area and backwash for chosen UF/MF. Open tool Available NF System Designer Check NF hardness rejection, if selected. Open tool Available Chemical Dosing Basis Calculator Calculate product feed from a selected dose. Open tool Available Activated Carbon Sizing Size a selected carbon bed from loading. Open tool

Supporting research

Supporting research

Semiconductor Ultrapure Water: Why the Failure Mode Isn't Purity, It's the 0.006% You Didn't Test ForModern UPW trains already hit 18.2 MΩ·cm and sub-ppb TOC as a matter of routine. The events that actually shut down a fab — Intel's 2001 urea excursion, biofilm in dead-legs — trace back to trace-level feedwater chemistry and biology that standard monitoring wasn't built to catch, not to insufficient purification.Chemical Treatment Programs for Reverse Osmosis Membrane Systems: Antiscalants, Dechlorination, Biocides, and Cleaning FormulationsA functional breakdown of the six chemical treatment categories governing RO membrane performance — antiscalants, dechlorination, biocides, coagulants, pH adjustment, and CIP — with dosing benchmarks, compatibility limits, and advanced fouling-monitoring parameters.

03 Research and Intelligence Context

Research and Intelligence Context

Supporting research and current industry signals for this workflow.

Supporting research

Semiconductor Ultrapure Water: Why the Failure Mode Isn't Purity, It's the 0.006% You Didn't Test ForModern UPW trains already hit 18.2 MΩ·cm and sub-ppb TOC as a matter of routine. The events that actually shut down a fab — Intel's 2001 urea excursion, biofilm in dead-legs — trace back to trace-level feedwater chemistry and biology that standard monitoring wasn't built to catch, not to insufficient purification.DCS vs. PLC in Water Treatment: Why Continuous Chemistry and Discrete Logic Need Different Control ArchitecturesA distributed control system and a programmable logic controller can both open the same valve, but they were built on opposite assumptions about what a plant is. Picking the wrong one for a zero-liquid-discharge evaporator or a scattered pump-station network doesn't show up on day one — it shows up years later, as downtime.Chemical Treatment Programs for Reverse Osmosis Membrane Systems: Antiscalants, Dechlorination, Biocides, and Cleaning FormulationsA functional breakdown of the six chemical treatment categories governing RO membrane performance — antiscalants, dechlorination, biocides, coagulants, pH adjustment, and CIP — with dosing benchmarks, compatibility limits, and advanced fouling-monitoring parameters.

Current intelligence

Semiconductor Water Modelling Pushes PFAS and Circularity Upstream Into Fab DecisionsA new industry interview highlights imec and FTD Solutions work linking manufacturing-process models with facility water, wastewater and chemical systems.Samsung E&A Secures Landmark $790 Million Integrated EPC and O&M Water Treatment ContractSouth Korean engineering major expands Middle Eastern footprint with a massive $790 million industrial water supply project combining turnkey execution with a 20-year operational lifecycle.