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Ferramenta de engenharia · Química

CT e residual de cloro/cloraminas

Calcule o tempo de contato teórico e com fator de chicanas, o CT com residual medido e resumos de exposição por segmento.

Purificação municipal de água potávelEtapa 05 — Disinfection
Status
Disponível
PROJECT · OPTIONAL

Project metadata

Optional report context; it does not change calculations.Edit detailsHide details

01 · USER INPUT

Design basis and inputs

Initial residual basis
Contact configuration
Browser calculation. Criterion comparisons are screening only; no regulatory compliance conclusion or pathogen credit is provided.

02 · CALCULATED RESULT

Structured results

Enter the active design basis, then calculate to create a result.

03 · REPORTING

Exports and verification

Exports include only the selected residual basis and active contact configuration. A current result is required.

Verification suite

Calculation revision 1.1

Focused deterministic tests cover single-basin and multi-segment residual propagation, CT methods, optional criteria, active basis selection, and validation.

Esta ferramenta de engenharia está disponível atualmente apenas em inglês.

01

Base de engenharia

Metodologia

Usa o ramo dose menos demanda ou residual inicial medido e combina detenção nominal com fator de chicanas informado para avaliar residual e CT por segmento. Critérios informados e decaimento genérico não são crédito CT regulatório automático nem cálculo regulatório de CT.

Available calculation branches are dose-minus-demand or directly measured initial residual, and single-basin or serial multi-segment contact. There is no separate free-chlorine/chloramine selector; the same generic user-entered decay model is used for either intended chemistry.

Calculated initial residual = max(dose − user-entered demand, 0), unless directly measured initial residual is selected.

First-order modeled residual uses Cend = Cstart exp(−kT10) in each contact segment.

Theoretical detention = volume / flow. T10 = user-entered baffling factor × theoretical detention.

Multi-segment Residual × T10 sums each segment modeled end residual × segment T10, using an entered measured final outlet residual for the final segment term when supplied, including 0 mg/L.

Integrated first-order exposure sums Cstart(1−exp(−kT10))/k, with the k=0 limit Cstart×T10.

The user-entered CT criterion compares with single-basin Residual × T10 or, in multi-segment mode, segment-summed Residual × T10. This is not regulatory CT credit.

Escopo / Limitações

  • Mantenha separados os somatórios residual×T10 por segmento, residual de saída×T10 total e exposição integrada de primeira ordem; residual medido igual a zero é válido.
  • Residuals, dose, and demand use an entered chlorine-equivalent basis in mg/L as Cl2. The model does not distinguish free chlorine from chloramine, model chemical-specific reactions, or select chemistry-specific decay coefficients.
  • There are no pH, temperature, organism, log-inactivation, or reference CT-table inputs. This tool does not calculate required CT or regulatory/pathogen credit; the user-entered CT criterion is a comparison value only.
  • No jurisdiction-specific compliance conclusion, automatic pathogen credit, DBP prediction, or chemical recommendation.
  • Regulatory CT profiling uses measured residual and peak-hour flow for each disinfection segment. This screen uses a user-entered design flow in m³/d, baffling-factor estimates, model-derived intermediate residuals, and at most one measured final residual; its Residual × T10 outputs are not regulatory CTcalc.
  • Baffling factor and decay constant are project inputs. Integrated first-order exposure is not automatically equivalent to a regulatory CT-credit method.
02

Caminho de engenharia

Contexto a montante

  • Base de tratamento avançado direcionado Só avance com adsorção ou oxidação quando um objetivo específico de qualidade da água justificar essa barreira.

Decisão desta ferramenta

  • CT e residual de cloro/cloraminas Calcule o tempo de contato teórico e com fator de chicanas, o CT com residual medido e resumos de exposição por segmento.

Próxima etapa de engenharia